Fabrication of three-dimensional microstructures using standard ultraviolet and electron-beam lithography

J. Galas , B. Belier , A. Aassime , J. Palomo , D. Bouville , J. Aubert

Bibtex , URL
J. Vac. Sci. Technol. B, 22, 3
Published 01 Jan. 2004
DOI: 10.1116/1.1755213
ISSN: 1071-1023


We have designed and fabricated shape-controlled three-dimensional structures combining electron-beam and ultraviolet (UV) lithography. Starting with a tiff file format, a gray scale pattern using a high energy beam sensitive mask is produced with electron-beam direct writing. In only a one step UV exposure, an optical lens and a photonic band gap structure in 16.5 mum thick AZ 4562 positive photoresist, with controlled profile and smooth resist surface, were fabricated. A three-dimensional grid structure was also transferred to a 100 mum thick SU-8 negative photoresist. (C) 2004 American Vacuum Society.